PE-CVD System
Model： CME
Production-scale PE-CVD system, ideal for deposition of silicon-based insulating and barrier films in mass production. Featuring a tray transfer system, the system is capable of handling a variety of substrates while offering excellent cost performance.
Features
- Supports 27.12 MHz high-density plasma processes.
- Compatible with SiH4-based films: SiO2, SiNx, SiON, a-Si, and TEOS-based film:SiO2.
- Chamber cleaning available using NF3+Ar plasma.
- Substrate size:
Model: CME-200E 200mm square
Model: CME-400E 300 x 400mm square
Model: CME-500E 500mm square
Applications
- Power device
- LED, LD, High-speed device
- OLED
- Solar cell
- MEMS
