PE-CVD System
Model： CC-200
A compact and user-friendly PE-CVD system that supports applications from R&D to small-scale production.
Features
- Supports 27.12 MHz high-density plasma processes.
- Compatible with SiH4-based films: SiO2, SiNx, SiON, a-Si, and TEOS-based film:SiO2.
- Chamber cleaning available using CF4+O2 plasma.
- Supports a heater for low-temperature deposition, ideal for OLED applications.
- Tray transfer system supports a variety of wafer sizes.
Applications
- Power devices
- Compound-related devices of LED, LD and highspeed devices
- OLED for R&D use
- Solar battery for R&D use
- MEMS
