Dry Etching System
Model：NLD-5700
Production-scale dry etching system featuring low-pressure, low-electron temperature, high-density plasma developed by our proprietary magnetic Neutral Loop Discharge (NLD) technology.
Features
- The system comes standard with a cassette chamber and can be used as production-scale system with the addition of an aligner mechanism.
- Additional etching chambers and ashing chambers can be equipped.
- Compared to the ICP method, the NLD generates plasma with lower pressure, higher density, and lower electron temperature, enabling the processing of materials such as quartz, glass, crystal, LN, and LT substrates.
- Chamber maintenance is simple and efficient.
- A wide range of process solutions is available, from mask etching to etching of quartz and glass.
Applications
- Optical Devices (diffraction grating, waveguide, amplifier, optical switch etc.)
- Microlens
- Photonics
- μ-TAS
