Evaporation System
Model： ei-5、EVD-600LP
The batch-type high-vacuum evaporation systems include the versatile Model: ei-5, designed for research and small-scale production, and the production-oriented Model: EVD-600LP, ideal for lift-off processes. These systems are designed for depositing metals and oxides onto substrates and feature centralized control from the operation panel, allowing automatic management of both exhaust and deposition processes.
Features
Model： ei
- Supports various evaporation sources (EB, RH, EB + RH etc.).
- Substrate holders tailored to the process (lift-off, planetary, satellite, etc.).
- Excellent operability and features via PC (recipe function, data logging, maintenance assist functions).
- Compatible with substrates ranging from Φ50 to Φ200mm, rectangular substrates, Si, compound materials, glass, ceramics, etc.
Model： EVD
- Improved lift-off performance allows for mounting more substrates.
- Supports various evaporation sources (EB, RH, EB + RH etc.).
- Excellent operability and features via PC (recipe function, data logging, maintenance assist functions).
- Compatible with substrates ranging from Φ50 to Φ200mm, rectangular substrates, Si, compound materials, glass, ceramics etc.
Applications
- Compound-related devices for Power devices
- LED, LD and high-speed devices
- Various R&Ds activities
- Other general electronic devices
Specifications
| Model | ei-5 | EVD-600LP |
| Wafer holder | Revolution, Planetary, Satellite | Planetary |
| SS distance | 680mm | 730mm |
| Incidence angle | 4.3° Φ100mm 6.4° Φ150mm |
約4° Φ100mm
約6° Φ150mm |
| Evaporation source | EB gun, Resistance heating | |
| Standard pumping system | 16” Cryo pump | |
