Dry Etching System
Model： NLD-570
A dry etching system featuring low-pressure, low-electron temperature, high-density plasma developed by our proprietary magnetic Neutral Loop Discharge (NLD) technology.
Features
- The NLD generates plasma with lower pressure, higher density, and lower electron temperature compared to ICP, enabling processing of materials such as quartz, glass, crystal, LN, and LT substrates. It delivers precise etching with excellent shape control and surface smoothness.
- Chamber maintenance is simple and efficient.
- A wide range of process solutions is available, from mask etching to etching of quartz and glass.
Applications
- Optical Devices (diffraction grating, waveguide, amplifier, optical switch etc.)
- Microlens
- Photonics
- μ-TAS
