The ashing system is available in two types: one designed for wafers and the other for panels.
The wafer-compatible model features a wafer-size-free design, capable of handling a wide range of processes from next-generation wafer processes to wafer-level packaging. It is the most widely adopted device in semiconductor packaging processes.
The panel-compatible model supports panels up to 600mm square, allowing for uniform Descum processing and Ti etching even on large panels.
Model | NA-8000 | NA-1300 | NA-1500 |
Wafer Size(mm) | Φ100~200 | Φ200 and Φ300 | Max. 600mm square |
Process chamber | 1 | 2~6 | 2 |
Plasma Source | MW、RF | MW、VHF、RF | |
Applications | R&D~Small-scale production | Large-scale production | Panel level packaging(PLP) |
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