Sputtering System
Model： SMD
This is one of the Model: SMD with a total sales record of over 1,400 units. It is a multi-chamber sputtering system designed for forming metal films, ITO, IGZO, dielectric films, and more, primarily that is mainly used in the high-definition display industry.
Features
- Wide range of deposition processes are supported, based on ULVAC's abundant experience and data.
- Substrate-only transfer and side deposition method enable low particle generation.
- Low-temperature deposition technology for touch sensors.
- Automated film process tuning technology.
Applications
- TFT (Thin-film transistor) for high definition display
- Touch sensor panel
Specifications
| Model | G6 | G8.5～G8.6 | |
| SMD-1800 | SMD-2500X | ||
| Substrate size (mm) | 1500 × 1850 | 2200 × 2500 ～ 2290 × 2620 | |
| Deposition method | Side deposition method substrate-fixed deposition | ||
| Chamber configuration | 1) Loading/Unloading chambers (※1) | 2 | |
| 2) Transfer chambers | 1 | ||
| 3) Sputter chambers | Max 4 | ||
| High vacuum evacuation system | Cryopump or turbo molecular pump | ||
| Substrate transfer system | Vacuum transfer robot (Double arm type) | ||
*1 Substrate heating heater can be optionally installed.