Model: ENTRON-EXX | Sputtering Equipment | Product Introduction | ULVAC
Sputtering System

Model: ENTRON-EXX

The ENTRON-EXX is a versatile, multi-chamber platform designed to support the production of a wide variety of cutting-edge products, including semiconductor logic, memory (DRAM, NAND, next-generation non-volatile memory), and packaging. By integrating a variety of process modules̶such as PVD, pre-clean, heating, cooling̶with enhanced data collection and analysis capabilities, the ENTRON-EXX provides customers with an optimized environment for both development and mass production.

Features

  • Offers two versatile platform options, Single and Tandem *, enabling customers to select the best platform to fit their factory spaces, thereby achieving maximum productivity per unit of space.
  • Enables quick module additions and swaps, providing flexibility to adapt to changing needs.
  • Capable of accommodating up to 12 modules (PVD, pre-clean, heating, cooling).
  • Enhanced data collection and analysis capabilities to improve yield, support preventive maintenance, and drive operational efficiency.

*A Single  platform features a single transfer chamber (Core), offering a simple and space-efficient design. A Tandem platform features two transfer chambers (Cores) arranged in sequence, ideal for complex processes that require higher productivity.

Applications

  • Fabrication of semiconductors: Logic, DRAM, NAND, NVM
    Deposition processes for semiconductor fabrication, including metal interconnects, patterning masks, electrodes, and other functional films.

Product introduction video

The product information for the legacy model: ENTRON-EX W300

This site uses cookies to acquire and use access data for the purpose of customer convenience and understanding of usage status. If you agree to the use of cookies,
Please click "I agree." Please check our "Privacy Policy" and "Cookie Policy."

Agreed