The batch-type high-vacuum evaporation systems include the versatile Model: ei-5, designed for research and small-scale production, and the production-oriented Model: EVD-600LP, ideal for lift-off processes. These systems are designed for depositing metals and oxides onto substrates and feature centralized control from the operation panel, allowing automatic management of both exhaust and deposition processes.
Model | ei-5 | EVD-600LP |
Wafer holder | Revolution, Planetary, Satellite | Planetary |
SS distance | 680mm | 730mm |
Incidence angle | 4.3° Φ100mm 6.4° Φ150mm |
約4° Φ100mm 約6° Φ150mm |
Evaporation source | EB gun, Resistance heating | |
Pumping system | 16” Cryo pump |
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