Model: ei-5、EVD-600LP|Evaporation System|Products|ULVAC, Inc.
Evaporation System

Model: ei-5, EVD-600LP

The batch-type high-vacuum evaporation systems include the versatile Model: ei-5, designed for research and small-scale production, and the production-oriented Model: EVD-600LP, ideal for lift-off processes. These systems are designed for depositing metals and oxides onto substrates and feature centralized control from the operation panel, allowing automatic management of both exhaust and deposition processes.

Features

Model: ei

  • Supports various evaporation sources (EB, RH, EB + RH etc.).
  • Substrate holders tailored to the process (lift-off, planetary, satellite, etc.).
  • Excellent operability and features via PC (recipe function, data logging, maintenance assist functions).
  • Compatible with substrates ranging from Φ50 to Φ200mm, rectangular substrates, Si, compound materials, glass, ceramics, etc.

Model: EVD

  • Improved lift-off performance allows for mounting more substrates.
  • Supports various evaporation sources (EB, RH, EB + RH).
  • Excellent operability and features via PC (recipe function, data logging, maintenance assist functions).
  • Compatible with substrates ranging from Φ50 to Φ200mm, rectangular substrates, Si, compound materials, glass, ceramics etc.

Applications

  • Compound-related devices for Power devices
  • LED, LD and high-speed devices
  • Various R&Ds activities
  • Other general electronic devices

Specifications

Model ei-5 EVD-600LP
Wafer holder Revolution, Planetary, Satellite Planetary
SS distance 680mm 730mm
Incidence angle 4.3° Φ100mm
6.4° Φ150mm
約4° Φ100mm
約6° Φ150mm
Evaporation source EB gun, Resistance heating
Pumping system 16” Cryo pump

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