Thermal Processing System
Horizontal FurnaceH Series
Highly reliable thermal processing system with over thirty years of experience.It can be used for heat treatment such as oxidation, diffusion, and anneling of 200mm silicon wafers.
Features
- Horizontal furnace used as oxidation furnace, diffusion furnace, and annealing furnace
- Selectable from 3 types of models according to processing volume.
- Run different processes with one device.
Three or four tubes configuration save space. - 5 zone heaters are respectively independent, so it is possible to controll with excellent temperature uniformity and stability.
- Original control system dedicates easy and reliable operation.
- Regarding H83-125 and H84-125, it is easy to load on the top of tube because they have boat elevator as standard.
- Pyrogenic wet oxide, wet oxide, dry oxide, Phosphorus and Boron doping with POCl3 or BBr3, and anneal.
Applications
- Thermal oxidation, diffusion, and anneal for silicon wafer.
Specifications
| Model | H83-50 | H83-125 | H84-125 |
| Process | Oxidation, diffusion, anneal | ||
| Wafer size | ～200mm (8 inch) | ||
| Number of tube | 3 | 3 | 4 |
| Product load | 50 | 125 | 125 |
| Temp. control zone | 5 | ||
| Heater material | Fe-Cr-Al | ||
| Operation Temp（℃） | 600～1200 | ||
| Soaking zone（mm） | 370 | 800 | 800 |
| Temp. uniformity（℃） | ±1.0 | ||