Model: SV|Sputtering System|Products|ULVAC, Inc.
Sputtering System

Model: SV

A vertical batch-type drum sputtering system capable of processing a large number of substrates. Designed as a simple and general-purpose model, it meets a wide range of needs.

Features

  • The rotary drum type allows for the processing of multiple substrates at once, making it ideal for small to medium-scale production or low-volume, high-variety production.
  • Supports square substrates and thick-film deposition.

Applications

  • Deposition of electrode films, insulating films or dielectric films on various substrates

Specifications

Model SV-4540 SV-6040 SV-9040
Standard pumping system 12-inch cryopump 12-inch cryopump 16-inch cryopump
Final pressure 6.7e-5Pa 6.7e-5Pa 6.7e-5Pa
Deposition direction Side Side Side
Deposition area uniformity Static Rotary L300mm ± 10% L300mm ± 10% L400mm ± 10%
Substrate heating 250°C 250°C 250°C
Control system Automatic Automatic Automatic
Options (except SV-200) Turbo pump Drainage cold electrode
Oil diffusion pump APC mechanism
Simultaneous multi-source deposition Substrate reversing mechanism
Down deposition Reactive sputter
Conventional cathode
Cathode for strong magnets
RF etch cleaning (SV-4540)
Bias mechanism (SV-4540)

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