Diffusion Furnace
Model： H83 / H84
Highly reliable thermal processing system with over thirty years of experience.It can be used for heat treatment such as oxidation, diffusion, and anneling of 200mm silicon wafers.
Features
- Horizontal furnace used as oxidation furnace, diffusion furnace, and annealing furnace
- Selectable from 3 types of models according to processing volume.
- Run different processes with one device. Three or four tubes configuration save space.
- 5 zone heaters are respectively independent, so it is possible to controll with excellent temperature uniformity and stability.
- Original control system dedicates easy and reliable operation.
- Regarding H83-125 and H84-125, it is easy to load on the top of tube because they have boat elevator as standard.
- Pyrogenic wet oxide, wet oxide, dry oxide, Phosphorus and Boron doping with POCl 3 or BBr3, and anneal.
Applications
- Thermal oxidation, diffusion, and anneal for silicon wafer.
Specifications
| Model | H83-50 | H83-125 | H84-125 |
| Process | Oxidation, diffusion, anneal | ||
| Wafer size [mm] | ～ 200（8 inch） | ||
| Number of tube | 3 | 3 | 4 |
| Product load | 50 | 125 | 125 |
| Temp. control zone | 5 | ||
| Heater material | Fe-Cr-Al | ||
| Operation Temp. [℃] | 600～1200 | ||
| Soaking zone [mm] | 370 | 800 | 800 |
| Temp. uniformity [℃] | ±1.0 | ||