NANOMETAL INKs are produced by the Gas Evaporation Method. These newly developed inks consist of metal nanoparticles dispersed stably and not aggregated in some organic solvent. The inks enable to form electro-conductive fine patterns directly by printing processes such as ink-jet printing.
Curing temperature as low as 150°C
L-Ag NANOMETAL INK (Solvent: Toluene)
L-Ag NANOMETAL INK (Solvent: Tetradecane) Ink-jet Type
TEM image of Ag nanoparticles dispersed in L-Ag NANOMETAL INK Average particle size is 2.6nm
■Particle size distribution of L-Ag NANOMETAL INK(Low temperature type)
■Electric resistivity vs. curing temperature of L-Ag NANOMETAL INK films
■Ag electronic circuit pattern formed by ink-jet printing on PET
Product Name | Au NANOMETAL INK | Ag NANOMETAL INK |
Ag NANOMETAL INK |
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Grade | Au1T | Au1Chb | Ag1T | Ag1TeH | L-Ag1T | L-Ag1TeH |
For Ink-Jet | X | ○ | X | ○ | X | ○ |
Metal concentration(wt%) | 30 | 50-60 | 30 | 50-60 | 30 | 50-60 |
Solvent | Toluene | Cyclohexylbenzene | Toluene | Tetradecane | Toluene | Tetradecane |
Average Particle Size (nm) |
3-8 | 3-8 | 3-8 | |||
Viscocity (mPa・s) | <5 | 5-15 | <5 | 5-15 | <5 | 5-15 |
Coating characteristic | ||||||
Curing Condition | 250℃×60min (in Air) | 230℃×60min (in Air) | 150℃×60min (in Air) | |||
Thickness(μm) | <1 | <1 | <1 | |||
Resistivity (μΩ・cm) | approx.8 | approx.20 | approx.3 | approx.10 | ||
Substrate to be used |
Heat-resistant temperature of substrates should be higher than sintering temperature. (example:polyimide, glass, metal, ceramic etc.) |
Specifications are subject to change.
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