Others
Drying FurnaceAMF-1000
Drying FurnaceAMF-1000
ACF-500
ASF-500
ULVAC drying furnace is well-suited to recovery treatment of inner parts such as for vapor deposition system, color filter pretreatment, and degassing process in HV to UHV low pressure environment.
Use for degassing process after washing of semiconductor components UHV outer gas furnace for SEM parts.
Recovery treatment of inner parts such a s for vapor deposition system, Color filter pretreatment.
Features
- Adapt side open door system for easy maintenance.
- Sample size can fit to the size for flat panel [1m × 1m × 10 sheets, or 500Φ × 500L (mm)]
- Trap is equipped in order to eliminate the released substances during recovery.
- Temperature uniformity during heating and cooling, can be uniformly controlled in large area.
- Achieved 10-6Pa in ultimate pressure by standard system. Furthermore, 10-7Pa UHV model anneal furnaces are proposed.
Applications
- Recovery treatment of vacuum components
- Color filter pretreatment, small size panel annealing
- UHV outer gas for SEM parts, Degassing process after washing of semiconductor components
Specifications
| AMF-1000 | ASF-500 | ACF-500 | |
| Ultimate pressure | 7 × 10-6 Pa | 7 × 10-6 Pa | 7 × 10-6 Pa |
| Pumping | Cryo Pump, TMP+RP selectable | ||
| Heating area | 1000mm × 1000mm × 40H × 10 sheets | 500Φ×500L | |
| Substrate heating temperature | MAX450ºC | MAX350ºC | MAX450ºC |
| Temperature uniformity | 450ºC±10ºC | 350ºC±10ºC | 450ºC±10ºC |
| Heating method | Inner heating | Outer heating | Inner heating |