ULVAC drying furnace is well-suited to recovery treatment of inner parts such as for vapor deposition system, color filter pretreatment, and degassing process in HV to UHV low pressure environment.
Use for degassing process after washing of semiconductor components UHV outer gas furnace for SEM parts.
Recovery treatment of inner parts such a s for vapor deposition system, Color filter pretreatment.
AMF-1000 | ASF-500 | ACF-500 | |
Ultimate pressure | 7 × 10-6 Pa | 7 × 10-6 Pa | 7 × 10-6 Pa |
Pumping | Cryo Pump, TMP+RP selectable | ||
Heating area | 1000mm × 1000mm × 40H × 10 sheets | 500Φ×500L | |
Substrate heating temperature | MAX450ºC | MAX350ºC | MAX450ºC |
Temperature uniformity | 450ºC±10ºC | 350ºC±10ºC | 450ºC±10ºC |
Heating method | Inner heating | Outer heating | Inner heating |
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