IGBT Fabrication Flow

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ULVAC provides technologies such as ion implanters and sputtering equipment for the manufacturing process of power device IGBTs. Power device IGBT (Insulated Gate Bipolar Transistor) is an acronym for Insulated Gate Bipolar Transistor.

Power Device IGBT Process flow

1. Substrate

2. B+ Ion implantation

Using Ion implantation equipment

3. Mask insulated layer formed

Using CVD

Introduction of CVD system

4. Mask insulated layer patterned

Patterning insulated layer with etching and ashing

5. P+ ion implantation

Using Ion implantation equipment

6.Trench formed

Using etching equipment

Introduction of Etching system

7. Insulated layer formed

Using CVD

Introduction of CVD system

8. Insulated layer patterned 

Patterning insulated layer with etching and ashing

9. Emitter electrode formed

Using sputtering or evaporation

Introduction of Sputtering system

10. P+ FS layer formed

Using Ion implantation equipment

Introduction of Ion Implanter

11. B+(Collector) formed

Using Ion implantation equipment

Introduction of Ion Implanter

12. Collector formed

Using sputtering or evaporation

Introduction of Sputtering system

ULVAC Keytechnology

Ion Plantation

・ Improved IGBT performance by injecting phosphorus for the FS layer

・ Cost reduction by hydrogen injection for FS layer

Sputtering

・ Thin wafer transfer is possible

・ Stress adjustment

Etching

・ Supports Trench structure

PE-CVD

・ Low Damage Plasma driven at 27MHz

・ Stress control by substrate Bias is also possible

 

Contact Us

https://www.ulvac.co.jp/en/contact/elec_inquiry/