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Sputtering Targets

ITO Target

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ULVAC provides high quality targets contribute to high-functional films for FPDs.

Features

  • Stable and enhanced discharge during deposition through refinement and high dispersion of SnO2.
  • Good roughness of target surface.
  • High stability of film resistance after deposition.
  • Low particle

Product Line of ITO Targets

Item  Analysis method  Allowable level  Unit/composition  In2O3-10wt%SnO2  In2O3-5wt%SnO2  In2O3-3wt%SnO2 
Resistivity  Four probe method  - mΩ・cm 0.14 – 0.17  0.12 – 0.14  0.12 – 0.14 
Composition/ impurity element  SnO2  XFS  ±0.5  10.1 – 9.9  5 3
Fe  ICP-AES  ≤30  ppm  5.8 – 2.2  5.6 5.9
Cu  ICP-AES  ≤20  ppm  2.4 – <1  1.8 1
Pb  ICP-AES  ≤10  ppm  <4  <4  <4 
Al  ICP-AES  ≤10  ppm  3.8 – <1  1.5 1
Ni  ICP-AES  ≤10  ppm  1.0 – <1  <1  1.1

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