Top > EQUIPMENT > Magnetic Multilayer Cluster Tool
MagestTM S200

Sputtering System

Magnetic Multilayer Cluster Tool
MagestTM S200

For more Information


MagestTM S200 provides the multi-layer deposition of ultra thin films under the ultra high vacuum condition and is applicable for the deposition of various materials by RF or DC sputtering.


  • UHV (ultra-high vacuum) processes.
  • Triple-gun cathode.
  • Outstanding controllability and reproducibility with ultra-thin films of 10 nm or less
  • Excellent contorol of magnetic anisotropy and coercive force


  • MRAM and Magnetic Divice
  • Materials development


Loading/unloading chamber 1 Wafer stocker type
Transfer chamber 1 Double arm type
Pre-cleaning chamber 1 LT-ICP etching
Deposition chambers 4 Triple-gun cathode
Oxidation chamber 1 ISM radical oxidation
Deposition Film types MgO, Ta, NiFe, Pt, PtMn, CoFe, Ru, Al, other

For more Information