EQUIPMENT

Top > EQUIPMENT > Cluster-type Sputtrering System
SME-200E

Sputtering System

Cluster-type Sputtrering System
SME-200E

For more Information

sme200e

SME-200E is cluster type Sputtering system for research and development and production purpose.

Features

  • Substrate size up to φ200mm.
  • Process chamber up to three process chamber can be equipped.
  • Available for various application-specific process modules.
  • Substrate heating mechanism, simultaneous deposition and revolved deposition are available.

Applications

  • R&D
  • Production purpose

For more Information