EQUIPMENT

Top > EQUIPMENT > Drying Furnace
AMF-1000 ACF-500 ASF-500

Others

Drying Furnace
AMF-1000 ACF-500 ASF-500

For more Information

kansouro_e

ULVAC drying furnace is well-suited to recovery treatment of inner parts such as for vapor deposition system, color filter pretreatment, and degassing process in HV to UHV low pressure environment.
Use for degassing process after washing of semiconductor components UHV outer gas furnace for SEM parts.
Recovery treatment of inner parts such a s for vapor deposition system, Color filter pretreatment.

Features

  • Adapt side open door system for easy maintenance.
  • Sample size can fit to the size for flat panel [1m × 1m × 10 sheets, or 500Φ × 500L (mm)]
  • Trap is equipped in order to eliminate the released substances during recovery.
  • Temperature uniformity during heating and cooling, can be uniformly controlled in large area.
  • Achieved 10-6Pa in ultimate pressure by standard system. Furthermore, 10-7Pa UHV model anneal furnaces are proposed.

Applications

  • Recovery treatment of vacuum components
  • Color filter pretreatment, small size panel annealing
  • UHV outer gas for SEM parts, Degassing process after washing of semiconductor components

Specifications

  AMF-1000 ASF-500 ACF-500
Ultimate pressure 7 × 10-6 Pa 7 × 10-6 Pa 7 × 10-6 Pa
Pumping Cryo Pump, TMP+RP selectable
Heating area 1000mm × 1000mm × 40H × 10 sheets 500Φ×500L
Substrate heating temperature MAX450ºC MAX350ºC MAX450ºC
Temperature uniformity 450ºC±10ºC 350ºC±10ºC 450ºC±10ºC
Heating method Inner heating Outer heating Inner heating

For more Information