ULVAC solutions range from vacuum technology-based services to analysis services and after-sales services.
This system is a single-substrate laser scribing system that is used to remove the transparent electrode (TCO) films formed on the glass substrate by the laser ablation method using the near-infrared wavelength pulse oscillating laser.
This system consists of 6 IR lasers, 6 sets of laser light collection optical system, bridge type XY stage (X-axis: lower axis, Y-axis: upper axis on bridge), substrate conveyor mechanism, dust collector, laser power measuring instrument and control systems. It is achieved high accuracy and high stability for using fiber lasers and a stage made of granite.
ULVAC drying furnace is well-suited to recovery treatment of inner parts such as for vapor deposition system, color filter pretreatment, and degassing process in HV to UHV low pressure environment.
Use for degassing process after washing of semiconductor components UHV outer gas furnace for SEM parts.
Recovery treatment of inner parts such a s for vapor deposition system, Color filter pretreatment.