EQUIPMENT

Top > EQUIPMENT > PRODUCT CATEGORY > CVD System >

CVD System

ULVAC offers cluster-type and batch-type chemical vapor deposition systems and additionally offers systems specially designed for development, ranging from PE-CVD systems essential for a-Si and passive film deposition to metal CVD and thermal CVD systems.

ETP-CVD System
ULGLAZE Series

ULGLAZE

The ULGLAZE Series are Expanding Thermal Plasma CVD (ETP-CVD) systems for deposition of scratch and abrasion resistant coatings onto polycarbonate using monomer and O2 reagents.

In-line Type PE-CVD System
CCV Series

CCV

CCV series are vertical type CVD systems for deposition of a-Si. 30 years experience with key players. Isolated deposition camber and low deposition rate offers the high-quality film.

Single-substrate Plasma CVD Systems
CMD Series

cmd

The CMD Series are single-substrate CVD systems for deposition of silicon oxide and nitride films using SiH4 or TEOS. A high-frequency (27.12 MHz) power supply enables high-quality film deposition.

Carbon Nanotube Growth Experimenting System
CN-CVD-400

cncvd400_800

ULVAC developed the technique for growing carbon nanotube vertically and selectively on a substrate for the first time in the world. By using the microwave plasma CVD technique, ULVAC has succeeded in mass production of nanotubes with high purity. Drastic improvement of performance can be expected in many fields, including cells and storage of hydrogen.

Cluster-type PE-CVD System
CME-200E/400/500

cme200e

CME-200E/400 is the most suitable model in the PE-CVD series production system for deposition of Si films with application as Insulator or barrier layers.

Load-lock type Plasma-CVD System
CC-200/400

cc200400

CC-200/400 is a compact and easy-to-use system for R&D use and production.

▲Return to Top