CVD

Single-substrate Plasma CVD Systems
CMD Series

The CMD Series are single-substrate CVD systems for deposition of silicon oxide and nitride films using SiH₄ or TEOS. A high-frequency (27.12 MHz) power supply enables high-quality film deposition.

Cluster-type PE-CVD System
CME-200E/400/500

CME-200E/400 is the most suitable model in the PE-CVD series production system for deposition of Si films with application as Insulator or barrier layers.

Load-lock type Plasma-CVD System
CC-200/400

CC-200/400 is a compact and easy-to-use system for R&D use and production.

▲Return to Top

CVD

Single-substrate Plasma CVD Systems CMD Series

Cluster-type PE-CVD System CME-200E/400/500

Load-lock type Plasma-CVD System CC-200/400

Single-substrate Plasma CVD Systems
CMD Series

Cluster-type PE-CVD System
CME-200E/400/500

Load-lock type Plasma-CVD System
CC-200/400