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R&D Equipment for Display

ULVAC has immediately available products for the development of new FPDs, in areas of development from production technology to materials. ULVAC also offers systems for small-scale production.

Sputtering

Batch-type Sputtering System
SX Series

sx-200

Batch-type Sputtering System SX series is for batch type sputtering system for research & development and small production application.

Sputtering Coating Machine (Roll Coater Type)
SPW Series

SPW165

SPW Series is a equipment that can be sputtered optical thin film and metal etc multilayer film on plastic film.

Gas separation chanber for batch processing of high-function multilayer films.

Single-substrate Sputtering Systems
SMD Series / SMD-X Series

smd

The SMD Series are single-substrate sputtering systems for deposition of films such as metal films and ITO films. ULVAC has delivered a large number of these systems, for use in a wide range of production environments. ULVAC responds rapidly to feedback from production sites to improve the reliability of these models.

With the increase in size of LCD panels and manufacturing mother glass, manufacturing equipment has also become larger, requiring ever-larger equipment investments. For the past several years, ULVAC has been responding to increasing mother glass sizes by developing new-concept systems to replace the cluster-type systems currently prevalent. ULVAC's systems support larger substrate sizes while remaining compact and low-priced. The new concepts they employ enable staggered, highly effective investment with low initial outlay.

In-line Sputtering Systems
STD Series

STD

The STD Series are in-line sputtering systems for deposition of ITO films and other metal films. They can be used to deposit films such as low-resistance ITO films, transparent conductive films, and multilayer optical film for touch panel metal wire films.

Compact Sputter for Research & Development
CS-L

cs-l

It is possible to arrange for various module conbination; Atmospheric cassette, Single piece, Atmospheric transfer, Vaccum transfer. Compact design integrated with control unit.

Batch-type Sputtering Systems
SV Series

sv

Vertical batch-type sputter systems. Series models include the SV-200 disk stamper model, and carousel types for large-volume substrate processing.

Load-lock type Sputtering System
CS-200

CS200

Load-lock type Sputtering System CS 200 is for research & development and small production application.

Cluster-type Sputtrering System
SME-200E

sme200e

SME-200E is cluster type Sputtering system for research and development and production purpose.

CVD

Single-substrate Plasma CVD Systems
CMD Series

cmd

The CMD Series are single-substrate CVD systems for deposition of silicon oxide and nitride films using SiH4 or TEOS. A high-frequency (27.12 MHz) power supply enables high-quality film deposition.

Cluster-type PE-CVD System
CME-200E/400/500

cme200e

CME-200E/400 is the most suitable model in the PE-CVD series production system for deposition of Si films with application as Insulator or barrier layers.

Load-lock type Plasma-CVD System
CC-200/400

cc200400

CC-200/400 is a compact and easy-to-use system for R&D use and production.

Evaporation

Organic EL Manufacturing Systems
SOLCIET, SATELLA, NEW-ZELDA

oled

A complete lineup including a research system for materials development, a cluster system for low-volume production, and an in-line system for mass-production. The lineup supports a complete range of organic EL applications, with systems for micromolecular materials and systems for macromolecular organic materials.

Evaporation Roll Coater
EW Series

EWE-060

EW Series models are deposition systems for evaporation of metal or oxides onto continuously-wound plastic film, paper or metal foil. Models range from compact types for research, to systems for mass-production. They can be used to manufacture products such as packaging materials, capacitors and magnetic tape.

Small Evaporation System for R&D
EX-200

EX_200

This is an evaporation system for R&D use for the deposition of metal films and oxide films by using an EB gun and resistance heating evaporation sources.

Multi-chamber type Evaporation System
EME-400

eme400

EME-400 is the Multi-Chamber type Load Lock system with hexagonal shape core chamber. Transfer chamber is located in the center that is connected with each deposition chamber separated, and substrate is transferred by robot. The simultaneous deposition for mass production is available free of contamination.

Load-lock type Evaporation System
CV-200

cv200

CV-200 consists of two chambers; a load-lock chamber and an evaporation chamber. Employing the load-lock type system enables the process to be carried out in a constantly clean environment. It also provides superior film repeatability. Application ranges from R&D use to small production.

Batch-type High Vacuum Evaroration System
ei Series

ei

This is a batch type high vacuum evaporation system for the deposition of metal and oxide on a substrate. Since the operation panel of this system has an integrated control function that realizes automated vacuum and deposition process, it is recommended for R&D use as well as for small-scale manufacturing.

Organic Material Evaporation System for R&D
Mini-Lab

mini_lab

This is a load-lock type material evaporation system for R&D use which deposits organic films, alkali metal films and metal films.