ULVAC has immediately available products for the development of new FPDs, in areas of development from production technology to materials. ULVAC also offers systems for small-scale production.
The SMD Series are single-substrate sputtering systems for deposition of films such as metal films and ITO films. ULVAC has delivered a large number of these systems, for use in a wide range of production environments. ULVAC responds rapidly to feedback from production sites to improve the reliability of these models.
With the increase in size of LCD panels and manufacturing mother glass, manufacturing equipment has also become larger, requiring ever-larger equipment investments. For the past several years, ULVAC has been responding to increasing mother glass sizes by developing new-concept systems to replace the cluster-type systems currently prevalent. ULVAC's systems support larger substrate sizes while remaining compact and low-priced. The new concepts they employ enable staggered, highly effective investment with low initial outlay.
A complete lineup including a research system for materials development, a cluster system for low-volume production, and an in-line system for mass-production. The lineup supports a complete range of organic EL applications, with systems for micromolecular materials and systems for macromolecular organic materials.
EW Series models are deposition systems for evaporation of metal or oxides onto continuously-wound plastic film, paper or metal foil. Models range from compact types for research, to systems for mass-production. They can be used to manufacture products such as packaging materials, capacitors and magnetic tape.
EME-400 is the Multi-Chamber type Load Lock system with hexagonal shape core chamber. Transfer chamber is located in the center that is connected with each deposition chamber separated, and substrate is transferred by robot. The simultaneous deposition for mass production is available free of contamination.
This is a batch type high vacuum evaporation system for the deposition of metal and oxide on a substrate. Since the operation panel of this system has an integrated control function that realizes automated vacuum and deposition process, it is recommended for R&D use as well as for small-scale manufacturing.