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Ion Implantation System

High-energy Ion Implanter SOPHI-400

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SOPHI-400

SOPHI-400 is a cluster type, high-energy ion implanter applicable to 2400 keV.

Features

  • Cluster type
  • Thin wafers Compatible.
  • Parallel beam
  • High energy: 2400 keV
  • Wafer size: up to 200mm

Applications

Power device manufacturing process, IGBT

 

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