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SOPHI-200/260

Ion Implantation System

Medium Current Ion Implanter
SOPHI-200/260

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sophi-200

This tool, SOPHI-200/260, basically inherits exisiting medium current production model ion implanter, and remove over specification based on our sufficient experience as tool supplier. Therefore, thanks to effective cost reduction, we can offer inexpensive sales price with parallel scan capability.

Features

  • Applicable for 5 - 8 inch wafers.
  • Compact and light weight tool.
  • Excellent parallel beam performance.
  • Excellent for engergy and metal contamination.
  • Applicable for ultra thin wafers.

Applications

  • Semiconductor production.
  • Ultra thin wafers process such as power devices, etc.
  • R&D

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