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Ion Implant
High-energy Ion Implanter SOPHI-400
SOPHI-400 is a cluster type, high-energy ion implanter applicable to 2400 keV.
High-temp Ion Implanter for SiC
IH-860DSIC
Ion Implanter for mass production with high temp ESC for SiC.
Medium Current Ion Implanter
SOPHI-200/260
This tool, SOPHI-200/260, basically inherits exisiting medium current production model ion implanter, and remove over specification based on our sufficient experience as tool supplier. Therefore, thanks to effective cost reduction, we can offer inexpensive sales price with parallel scan capability.
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