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EX-200

Vacuum Evaporation System

Small Evaporation System for R&D
EX-200

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EX_200

This is an evaporation system for R&D use for the deposition of metal films and oxide films by using an EB gun and resistance heating evaporation sources.

Features

  • SUS chamber, compact.
  • Resistance heating evaporation sources (supports up to six sources) which can be chosen with an EB gun.
  • Diffusion pump, turbo-molecular pump and cryopump are available.
  • Substrate heating mechanism, simultaneous deposition and revolved deposition are available.

Applications

  • Various R&Ds

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