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Evaporation

Small Evaporation System for R&D
EX-200

EX_200

This is an evaporation system for R&D use for the deposition of metal films and oxide films by using an EB gun and resistance heating evaporation sources.

Multi-chamber type Evaporation System
EME-400

eme400

EME-400 is the Multi-Chamber type Load Lock system with hexagonal shape core chamber. Transfer chamber is located in the center that is connected with each deposition chamber separated, and substrate is transferred by robot. The simultaneous deposition for mass production is available free of contamination.

Load-lock type Evaporation System
CV-200

cv200

CV-200 consists of two chambers; a load-lock chamber and an evaporation chamber. Employing the load-lock type system enables the process to be carried out in a constantly clean environment. It also provides superior film repeatability. Application ranges from R&D use to small production.

Batch-type High Vacuum Evaroration System
ei Series

ei

This is a batch type high vacuum evaporation system for the deposition of metal and oxide on a substrate. Since the operation panel of this system has an integrated control function that realizes automated vacuum and deposition process, it is recommended for R&D use as well as for small-scale manufacturing.

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