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NE550EX is a multipurpose high-density plasma etching system, especially for test facilities such as universities and government agencies.
Dry etching system with ULVAC original NLD (Neutral Loop Discharge) Plasma Source.
Production type dry etching system with ULVAC original NLD (Neutral Loop Discharge) Plasma Source.
This system enable deep Si etching using ULVAC original process, doesn't use Bosch process nor Cyro Genics process. This system is also available for quartz etching.
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