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Etching

High-Density Plasma Etching System for R&D
NE-550EX

NE-550H

NE550EX is a multipurpose high-density plasma etching system, especially for test facilities such as universities and government agencies.

Dry Etching System for R&D
NLD-570

NLD570

Dry etching system with ULVAC original NLD (Neutral Loop Discharge) Plasma Source.

Dry Etching System for Opto-Devices, MEMS
NLD-5700

nld5700

Production type dry etching system with ULVAC original NLD (Neutral Loop Discharge) Plasma Source.

Si Deep Etching System
NLD-5700Si

nld-si

This system enable deep Si etching using ULVAC original process, doesn't use Bosch process nor Cyro Genics process. This system is also available for quartz etching.

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