Top > EQUIPMENT > APPLICATIONS > Optical Film >
ULVAC offers fine-tuned solutions for the production of single and multi-layer film used as UV protection film, IR protection film, anti-reflective film, and anti-fouling films, and that are also used in optical devices.
NE550EX is a multipurpose high-density plasma etching system, especially for test facilities such as universities and government agencies.
Dry etching system with ULVAC original NLD (Neutral Loop Discharge) Plasma Source.
Production type dry etching system with ULVAC original NLD (Neutral Loop Discharge) Plasma Source.
This system enable deep Si etching using ULVAC original process, doesn't use Bosch process nor Cyro Genics process. This system is also available for quartz etching.
The ULDiS series is the digital sputtering system that has enhanced the Meta Mode and realized the high-quality optical filters and coatings.
ULVAC has signed a License Agreement with JDS Uniphase Corporation of the U.S.
; License MetaMode® sputter for optical application. The ULDiS comes available to be placed at your business, and develops widely.
SRH Series is production system for deposition of metallic films for power device, WL-CSP, or UBM or similar application.
Batch-type Sputtering System SX series is for batch type sputtering system for research & development and small production application.
The STD Series are in-line sputtering systems for deposition of ITO films and other metal films. They can be used to deposit films such as low-resistance ITO films, transparent conductive films, and multilayer optical film for touch panel metal wire films.
SPW Series is a equipment that can be sputtered optical thin film and metal etc multilayer film on plastic film.
Gas separation chanber for batch processing of high-function multilayer films.
ULVAC's MPS Series are a new type developed using our wealth of experience and extensive sales record. Discharge can be maintained at a pressure, about one order of magnitude lower than the conventional sputter discharge pressure. The use of long throw sputtering enables better film thickness uniformity, and the diagonal incidence configuration is ideal for co-sputter and multilayer films.
It is possible to arrange for various module conbination; Atmospheric cassette, Single piece, Atmospheric transfer, Vaccum transfer. Compact design integrated with control unit.
Compact sputtering system is available for research and development of multi layer thin film, compound materials or other devices, using automatic process operation by PC. Also more large size substrate (4 inch dia.) than ever system is available.
Load-lock sputtering system suitable to fully automated production line for small size parts such as automotive mirrors and plastic moldings. Lineups are SPH-320/320M for 2 stage processing and SPH340M for 4 stage processing.
Vertical batch-type sputter systems. Series models include the SV-200 disk stamper model, and carousel types for large-volume substrate processing.
Load-lock type Sputtering System CS 200 is for research & development and small production application.
SME-200E is cluster type Sputtering system for research and development and production purpose.
EW Series models are deposition systems for evaporation of metal or oxides onto continuously-wound plastic film, paper or metal foil. Models range from compact types for research, to systems for mass-production. They can be used to manufacture products such as packaging materials, capacitors and magnetic tape.
This is an evaporation system for R&D use for the deposition of metal films and oxide films by using an EB gun and resistance heating evaporation sources.
EME-400 is the Multi-Chamber type Load Lock system with hexagonal shape core chamber. Transfer chamber is located in the center that is connected with each deposition chamber separated, and substrate is transferred by robot. The simultaneous deposition for mass production is available free of contamination.
CV-200 consists of two chambers; a load-lock chamber and an evaporation chamber. Employing the load-lock type system enables the process to be carried out in a constantly clean environment. It also provides superior film repeatability. Application ranges from R&D use to small production.
This is a batch type high vacuum evaporation system for the deposition of metal and oxide on a substrate. Since the operation panel of this system has an integrated control function that realizes automated vacuum and deposition process, it is recommended for R&D use as well as for small-scale manufacturing.
CME-200E/400 is the most suitable model in the PE-CVD series production system for deposition of Si films with application as Insulator or barrier layers.
CC-200/400 is a compact and easy-to-use system for R&D use and production.