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EGP-1G

EB Gun for Optical Evaporation
EGP-1G

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egp-1g

EGP-1G is the cost-reduced electron beam gun for optical evaporation by simple structure of 180°deflecting beam method. Further more, high repeatability of beam position after maintenance was realized by using two locating faces configuration.

Features

  • All parts to be removed and installed during maintenance are fixed by two locating faces.
  • Easy to replace filament,  and remove/install emitter.
  • Design based on long time experience as the vacuum process equipment manufacturer.
  • Easy assembly by reducing parts to 60% comparing with conventional unit.
  • Improved beam stability by shortening beam orbit.
  • Most suitable for evaporation of the oxide and compound by having high-speed sweep and vertical incidence function.

Applications

  • Evaporation source for electron beam evaporation
  • Evaporation source for ion plating
  • Evaporation source for roll coater evaporation

Specifications

Model
EGP-1G
Deflection angle
180°
Cooling-water flow rate
10L/min
Dimensions WxDxH
185mm x 239mm x 179mm
Weight
11kg
Maximum output
10kW
Accelerating voltage
-4 to -10kV
Maximum beam current
1A

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