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EGK/EGL/EGO Series

EB gun for vacuum evaporation
EGK/EGL/EGO Series

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EGL-35M

ULVAC EB guns for electron beam evaporation all use magnetic field deflection, and are structured to minimize contamination from the evaporated material. A wide lineup of models is available. The EGK Series is designed for low-capacity research applications, the EGL Series is for metal film production, and the EGO Series is for optical film production.

Features

  • EGK/EGL models are ideal for metal evaporation.
  • EGL models and EGO models are deflected 270° to eliminate filament contamination.
  • EGL models have high crucible cooling performance, and a structure that minimizes contamination.
  • EGO models have high-speed sweep and vertical incidence, ideal for use with oxide and compound evaporation.

Applications

  • Evaporation sources for electron beam evaporation

Specifications

[EB guns for metal films]

Crucible capacity
3cc 10cc 20cc 40cc 110cc
Quantity of crucibles 1 EGK-3 - - EGL-35 EGL-110
3 - EGL-103S
* 1
EGL-203S
* 1
- -
4 EGK-3M EGL-35M
* 2
- EGL-35M
*2
EGL-80M
6 - - EGL-206M
EGN-206M
EGL-406M
EGN-406M
-
*1 For ultra-high vacuums
*2 Standard type has two 10 cc crucibles and two 40 cc crucibles.

 

[EB guns for optical films]

Crucible capacity
10cc 20cc 40cc 110cc
Quantity of crucibles 4 EGO-40M
*1
- EGO-40M
*3
EGO-110M
6 - EGO-206M - -
*1 Standard type has two 10 cc crucibles and two 40 cc crucibles.

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