Sputtering System
Load-lock type

Cluster-type
Sputtrering SystemSME-200E

SME-200E is cluster type Sputtering system for research and development and production purpose.

Features

Substrate size up to Φ200mm.
Process chamber up to three process chamber can be equipped.
Available for various application-specific process modules.
Substrate heating mechanism, simultaneous deposition and revolved deposition are available.

Applications

R&D
Production purpose

Products