Sputtering Targets / Evaporating materials

Sputtering target for large-size devices of liquid crystal display
Sputtering target for large-size devices of liquid crystal display

Ta target for Entron
Ta target for Entron

Si target for optical devices
Si target for optical devices

Sputtering Targets/ Bonding

Sputtering Targets for Large-sized Liquid Crystal Displays (LCD)

・Large enough to match any mother sheet size of glass for FPD
・ITO targets (transparent dielectric material, with low particle and ultra-high density has been developed and provides high productivity)
・Super fine crystal splash free large-size aluminum target
・Mo, W , AlCe large-size targets

Sputtering Targets for Cu Wiring

・High purity Cu targets (6N)
・Ta targets with purity level of 4N5 is realized through melt purification in high vacuum condition
・Homogeneous target materials suitable for LTS (Long Throw Sputtering) are provided through the use of superior machining technology
・Low particle sputtering targets available for minute wiring


Sputtering Target(More Information)


Evaporating materials

A huge variety of materials to meet various demands.

・High-purity metals, alloys and compounds
・Low outgas due to vacuum melting

 

infomation

Please Contact : mate info
TEL :+81-3-5218-6026 / FAX :+81-3-5218-6027
Materials Division Overseas Sales Departmen