ULVAC, Inc. For Industrial Applications Of Vacuum Technology:Si Power Devices

Japanese

Home Product Information Si Power Devices（by Applications）

■ Si Power Devices

CE-300I High-Density Plasma Etching System for R&D
Si Deep Etching System NLD-500Si, NLD-6000Si
Ashing System Luminous NA-1000/1300
High-Temp Ion Implanter for SiC IH-860DSIC
Medium current Ion Implanter SOPHI-200
NEW! Dry Etching Tool APIOS NE-950EX
Dry Etching System for Production NE-5700/NE-7800
Dry Etching System for R&D NLD-570
Dry Etching System for Production NE-5700/NE-7800
Load-lock type Evaporation System CV-200
Load-lock type Sputtering System CS-200
Load-lock type Plasma-CVD System CC-200/400
Multi-chamber type Evaporation System EME-400
Small Evaporation System for R&D EX-200
Cluster type Sputtrering System SME-200E
Cluster-type PE-CVD System CME-200E/400
Batch type High Vacuum Evaroration System ei Series
NEW! Compact Sputter for Research & Development CS-L
NEW! Compact Etcher for Reserch & Development CE-L

[Components]
NEW! Reactive Process Gas Process Monitoring System Qulee RGM-202/RGM-302

NEW! Compact High-speed Spectroscopic Ellipsometer UNECS-2000
Vacuum Robot COVOT
Vacuum Robot KEYTRAN-IV Z
Small Vacuum Transfer Module NCH-mono
Vacuum Cluster Tool Integration Platform NCH-4000
Vacuum Transfer Module NCP-6000
NEW! Equipment diagnostic system FABISEQ

Contact List　Sitemap　Privacy Policy　Link Policy　Cautions on use

Copyright (C) ULVAC, Inc. All rights reserved.